Low Pressure | |||
| Session 646 - Semiconductor Surface Chemistry | |||
| This session will focus on fundamental chemistry on semiconductor surfaces. | |||
| Chair: | Christos G. Takoudis | ||
| CoChair: | John G. Ekerdt | ||
| 646a | Impact of Surface Chemistry and Mg:O Flux on Magnesium Oxide Thin Film Heteroepitaxy on Hexagonal Silicon Carbide for Integration of Functional Oxides Trevor L. Goodrich, Zhuhua Cai, Katherine S. Ziemer | ||
| 646b | Probing Interactions of Ge with Chemical and Thermal Si02 to Understand Selective Growth of Ge on Si during Molecular Beam Epitaxy Qiming Li, Joshua L. Krauss, Stephen Hersee, Sang M. Han | ||
| 646c | Investigations of Silane Adsorption and Reaction on Oxygen-Covered Metal Surfaces Dylan C. Kershner, Will Medlin | ||
| 646d | Surface Chemistry for the Growth of Epitaxial Oxide Layers on Si(001)-2x1 A. C. Cuadra, D. B. Skliar, W. A. Tisdale III, Brian G. Willis | ||
| 646e | Stm Manipulation and First Principles Simulation of a Molybdenum Disulfide Surface Hua Ma, Jian Shu Yang, Wangzuo Shangguan, Natarajan Chandrasekhar, Mark Saeys | ||
| 646f | Surface Chemistry of Ferroelectric Lithium Niobate Yang Yun, Min Li, Jun Wang, Diana Liao, Lorenz Kampschulte, Eric I. Altman | ||
| 646g | The Role of Dative Bonding in the Reactivity of Semiconductor and Metal Oxide Surfaces Yuniarto Widjaja, Collin Mui, Atashi Mukhopadhyay, Charles B. Musgrave | ||
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