Low Pressure

Session 383 - Computational Modeling of Surfaces and Surface Phenomena
This session will focus on the use of computational chemistry to model surface phenomena.
Chair:Gyeong S. Hwang
CoChair:Aravind R. Asthagiri
CoSponsor(s):Catalysis and Reaction Engineering Division
 Chiral Adsorption on Cu Surfaces
David S. Sholl, Rees B. Rankin, Bhawna Bhatia, Joanna James
 Development of the Oxygen Reduction Reaction Mechanism on Pt(111) Using Dft
Matthew P. Hyman, Will Medlin
 The Growth of Thin Metal Films on Polar Metal Oxides Surfaces: Insights from First-Principles Calculations
Aravind R. Asthagiri
 Strong Repulsive Forces between Protein and Phosphocholine Self-Assembled Monolayers - a Molecular Simulation Study
Yi He, Jason C. Hower, Jie Zheng, Shengfu Chen, Shaoyi Jiang
 Effects of the Combined Action of Electric Fields and Mechanical Stresses on the Morphological Stability of Solid Surfaces
Vivek Tomar, M. Rauf Gungor, Dimitrios Maroudas
 Ab Initio Phase Diagrams for Water Adsorbed on Monoclinic Hfo2
Atashi Mukhopadhyay, Javier Fdez. Sanz, Charles B. Musgrave
 Molecular Simulation Study of Nanoscale Friction between Phosphocholine Self-Assembled Monolayer Surfaces Immersed in Ionic Solution
Yi He, Shengfu Chen, Shaoyi Jiang

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