Polymers

Session 298 - Polymer Thin Films and Interfaces III
Block copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session focuses on the manipulation of thin film copolymer ordering using surfaces, electric fields, solvent annealing, topographical patterns, mechanical shearing, or other methods. Both experimental and theoretical works are welcome, and should highlight the characterization of thin film morphologies and provide useful insights into nanostructure formation.
Chair:Thomas H. Epps III
CoChair:Richard Elliott
 Introductory Remarks
 Investigation of Block Copolymer Behavior on Patterned
George J. Papakonstantopoulos, Kostas Daoulas, Francois Detcheverry, Marcus Muller, Paul F. Nealey, Juan J. De Pablo
 Symmetry Breaking in Block Copolymer Thin Films
Eric Cochran, Gila E. Stein, Glenn H. Fredrickson, Edward Kramer
 Self Assembly of Rod-Coil Block Copolymers and Homopolymers
Yuefei Tao, Bradley D. Olsen, Rachel A. Segalman
 Self-Assembly of Double-Gyroid Phase Block Copolymer/Silica Thin Films
Hugh W. Hillhouse, Vikrant Urade, Michael Tate
 Break
 Selectively Probing the Glass Transition Temperature in Block Copolymer Films
Connie B. Roth, John M. Torkelson
 Self-Assembly of Thin Polymer Film Via Electrohydrodynamic Instabilities
Ning Wu, Leonard F. Pease, William. B. Russel
 Effects of Flow and Interfacial Block Copolymer on Polymer-Polymer Adhesion
Jianbin Zhang, Timothy P. Lodge, Christopher W. Macosko

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