Polymers | |||
Session 298 - Polymer Thin Films and Interfaces III | |||
Block copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session focuses on the manipulation of thin film copolymer ordering using surfaces, electric fields, solvent annealing, topographical patterns, mechanical shearing, or other methods. Both experimental and theoretical works are welcome, and should highlight the characterization of thin film morphologies and provide useful insights into nanostructure formation. | |||
Chair: | Thomas H. Epps III | ||
CoChair: | Richard Elliott | ||
Introductory Remarks | |||
298a | Investigation of Block Copolymer Behavior on Patterned George J. Papakonstantopoulos, Kostas Daoulas, Francois Detcheverry, Marcus Muller, Paul F. Nealey, Juan J. De Pablo | ||
298b | Symmetry Breaking in Block Copolymer Thin Films Eric Cochran, Gila E. Stein, Glenn H. Fredrickson, Edward Kramer | ||
298c | Self Assembly of Rod-Coil Block Copolymers and Homopolymers Yuefei Tao, Bradley D. Olsen, Rachel A. Segalman | ||
298d | Self-Assembly of Double-Gyroid Phase Block Copolymer/Silica Thin Films Hugh W. Hillhouse, Vikrant Urade, Michael Tate | ||
Break | |||
298e | Selectively Probing the Glass Transition Temperature in Block Copolymer Films Connie B. Roth, John M. Torkelson | ||
298f | Self-Assembly of Thin Polymer Film Via Electrohydrodynamic Instabilities Ning Wu, Leonard F. Pease, William. B. Russel | ||
298g | Effects of Flow and Interfacial Block Copolymer on Polymer-Polymer Adhesion Jianbin Zhang, Timothy P. Lodge, Christopher W. Macosko |
See more of Materials Engineering and Sciences Division